Concentration or separation method, copolyamides copolyimide-amides and the use thereof

ABSTRACT

Mixtures of salts of organic carboxylic acids and organic compounds of non-salt character, dissolved in a C 1  -C 4  alkanol, can be concentrated or separated with a semipermeable membrane made from a copolyamide or copolyimide-amide which contains (a) a first aromatic diamine radical and (b) a second aromatic diamine radical which carries --SO 3  M groups, where M is H.sup.⊕, a monovalent to polyvalent metal cation or an ammonium cation. Provided the first diamine radical contains C 1  -C 4  alkyl groups in the o-positions to the amino groups, the copolymers are radiation-sensitive and can be used for producing protective layers or relief images, development being carded out in an aqueous alkaline medium.

This application is a divisional of Ser. No. 07/984,808, filed Dec. 3,1992, now U.S. Pat. No. 5,322,922, which is a divisional of Ser. No.07/744,622, filed Aug. 12, 1991, now U.S. Pat. No. 5,198,119.

The present invention relates to a process for concentrating orseparating salts of organic carboxylic acids from organic compounds ofnon-salt character, which comprises contacting a solution of said saltsand compounds in a low molecular alkanol with one side of asemipermeable membrane made from a copolyamide or copolyimide-amidewhich contains sulfonic acid groups, the pure low molecular alkanolbeing present on the other side of the membrane. The invention furtherrelates to aromatic copolyamides and copolyimide-amides of two aromaticdiamines, one of which contains sulfonic acid groups, and to a processfor their preparation, as well as to a coated material and a process forthe preparation of protective layers or relief images using saidmaterial.

Copolyamides of (1) diphenylsulfone diamines which are unsubstituted oralkyl-substituted in the nucleus, (2) aromatic diamines which containsulfonic acid groups which may be in salt form, and aromaticdicarboxylic acids are, disclosed in Ca 110:25827c (1989). Semipermeablemembranes made therefrom when used for the removal of salts from aqueoussalt-containing solutions by reverse osmosis have an enhanced saltretention.

Surprisingly, it has been found that mixtures of salts of organiccarboxylic acids and organic compounds of non-salt character, whichmixtures are in the form of solutions in low molecular alkanols, canalso be concentrated or separated with the aid of membranes made fromcopolyamides or copolyimide-amides in which one amine radical containssulfonic acid groups which may be in salt form.

In one of its aspects, the invention relates to a process forconcentrating or separating salts of organic carboxylic acids fromorganic compounds of non-salt character with the aid of semipermeablemembranes, which process comprises contacting a solution of the saltsand organic compounds in an unsubstituted or C₁ -C₃ alkoxy-substitutedC₁ -C₄ alkanol, mixtures of such alkanols or mixtures of such alkanolswith ethers, with one side of the membrane, the pure solvent beingpresent on the other side of the membrane, and said membrane is madefrom a copolyamide or copolyimide-amide of (a) at least one aromaticdicarboxylic acid radical of 8 to 20 carbon atoms and/or (b) at leastone trivalent aromatic tricarboxylic acid radical of 9 to 20 carbonatoms, each of which radicals is unsubstituted or substituted byhalogen, nitro, C₁ -C₄ alkyl or C₁ -C₄ alkoxy, (c) at least one firstdivalent and/or trivalent mononuclear or binuclear aromatic diamineradical and (d) at least one second divalent and/or trivalent aromaticmononuclear or binuclear diamine radical containing at least one --SO₃ Mgroup, each of which radicals is unsubstituted or substituted by halogenor C₁ -C₄ alkyl, and M is H.sup.⊕, a mono- to trivalent metal cation,NH₄.sup.⊕ or an organic ammonium cation of 1 to 30 carbon atoms.

The concentration of the salts and organic compounds is preferably0.0001 to 10 percent by weight, more particularly 0.001 to 5 percent byweight and, most preferably, 0.001 to 3 percent by weight.

The thickness of the membrane may be from 5 to 300 μm, preferably from20 to 200 μm.

M in the SO₃ M group as ammonium cation may be NH₄.sup.⊕ or an ammoniumcation of a primary, secondary or tertiary open-chain amine containingpreferably 1 to 24, most preferably 1 to 16, carbon atoms, or anammonium cation of a monocyclic or bicyclic secondary or tertiary amineor of a tricyclic tertiary amine containing preferably 4 to 12 carbonatoms.

M as a metal cation can be a mono- to trivalent cation of metals of themain groups and subgroups, of the transition metals and of the noblemetals. Mono- or divalent cations are preferred. Typical examples ofmetals are: Li, Na, K, Rb, Cs, Mg, Ca, Sr, Ba, In, Sn, Pb, Cu, Ag, Au,Zn, Cd, Hg, Cr, Mo, Mn, Fe, Co, Ni, Rn, Rh, Pd, Ir, Pt, Sb, Bi, as wellas the group of the rare earth metals. Preferred metals are the alkalineand alkaline earth metals, Cu, Ag, Au, Fe, Co, Ni, Zn, Cd and Mn.

In a preferred embodiment of the invention, M is H.sup.⊕, NH₄.sup.⊕, analkali metal cation or a primary, secondary, tertiary or quaternaryammonium cation of 1 to 24 carbon atoms.

The alkanol used as solvent contains 1 to 4, and, preferably, 1 to 3,carbon atoms. It may be substituted by methoxy or ethoxy. Representativeexamples of such alkanols are: methanol, ethanol, n- and isopropanol,n-, iso- and tert-butanol, methoxyethanol, ethoxyethanol,propoxyethanol, 1-methoxypropan-3-ol, 2-methoxypropan-1-ol. Preferredsolvents are methanol, ethanol, 1- or 2-propanol and 2-methoxyethanol.It is also possible to use mixtures of the alkanols with one another orwith ethers, such as diethyl ether or ethylene glycol dimethyl ether.

The salt of the organic carboxylic acid may be an ammonium or a metalsalt, such as NH₄.sup.⊕, an ammonium cation of a primary, secondary ortertiary amine containing a total of 1 to 20 carbon atoms, an alkalimetal salt or an alkaline earth metal salt. Alkali metal salts andammonium salts are preferred. NH₄.sup.⊕ and Li.sup.⊕ salts are mostpreferred.

The organic carboxylic acid may be selected from mono-, di-, tri- ortetracarboxylic acids. Aliphatic, cycloaliphatic, aromatic andheterocyclic or heteroaromatic monocarboxylic acids which contain 1 to18, preferably 1 to 12, carbon atoms, are preferred.

In a preferred embodiment of the invention, the organic acid has theformula (A)

    R.sub.a --X--COOH                                          (A)

wherein X is a direct bond, C₁ -C₄ alkylene, C₂ -C₄ alkylidene or C₂ -C₄alkenylene, R₃ is H, C₁ -C₁₂ alkyl, C₂ -C₁₂ alkenyl, C₂ -C₁₂ alkynyl, C₃-C₁₂ cycloalkyl, C₃ -C₁₂ cycloalkenyl, C₆ -C₁₆ aryl, C₃ -C₁₂heterocycloalkyl, C₃ -C₁₂ heterocycloalkenyl, C₆ -C₆ heteroaryl, whichare unsubstituted or substituted by --OH, --SH, --CN, --NO₂, halogen, C₁-C₆ alkyl, C₁ -C₆ alkoxy, C₁ -C₆ alkylthio, C₁ -C₆ alkyl-Y--, where Y is--CO--, --SO--, --SO₂ --, --CO--O--, --O--CO--, --CO--NR_(b) R_(c) --,--NR_(b) R_(c) --CO--, and R_(b) and R_(c) are each independently of theother H, C₁ -C₆ alkyl, C₂ -C₄ hydroxyalkyl or R_(b), and R_(c) , whentaken together, are tetramethylene, pentamethylene or3-oxapentyl-1,4-ene.

R_(a) as alkyl, which may be linear or branched, is typically methyl,ethyl, n- and isopropyl, n- and isobutyl, pentyl, hexyl, heptyl, octyl,nonyl, decyl, undecyl and dodecyl.

R_(a) as alkenyl, which may be linear or branched, is typically vinyl,crotonyl, allyl, but-1-en-1-yl, but-1-en-2-yl, but-1-en-3-yl,but-1-en-4-yl, but-2-en-1-yl, but-2-en-2-yl, but-2-en-4-yl, pentenyl,hexenyl, heptenyl, octenyl, nonenyl, decenyl, undecenyl and dodecenyl.

R_(a) as alkynyl, which may be linear or branched, is typically ethynyl,prop-2-yn-1-yl, prop-2-yn-3-yl, butynyl, pentynyl, hexynyl, heptynyl,octynyl, decynyl and dodecynyl.

R_(a) as cycloalkyl and cycloalkenyl preferably contains 4 to 8, mostpreferably 5 or 6, carbon atoms. Typical examples are cyclopropyl andcyclopropenyl, cyclobutyl and cyclobutenyl, cyclopentyl andcyclopentenyl, cyclohexyl and cyclohexenyl, cycloheptyl andcycloheptenyl, cyclooctyl and cyclooctenyl.

R_(a) as aryl preferably contains 6 to 12 carbon atoms. Typical examplesare phenyl, biphenyl and naphthyl.

R_(a) as heterocycloalkyl and heterocycloalkenyl preferably contains 4to 8, most preferably 4 to 6, ring carbon atoms. Preferred hetero atomsare those selected from the group consisting of O, S and NR_(d), whereinR_(d) is H, C₁ -C₆ alkyl or C₁ -C₇ acyl. R_(a) as heteroaryl preferablycontains 4 to 11 ring carbon atoms and, preferably, hetero atomsselected from the group consisting of O, S and --N═. Typical examples ofheterocycles are pyrrolidine, tetrahydrofuran, tetrahydrothiophen,pyrroline, dihydrofuran, dihydrothiophene, indane, dihydrocoumarone,dihydrobenzothiophene, carbazole, dibenzofuran, dibenzothiophene,pyrazolidine, imidazolidine, pyrazoline, imidazoline, benzimidazolidine,oxazolidine, oxazoline, thiazolidine, thiazoline, isooxazolidine,isooxazoline, isothiazolidine, isothiazoline, benzoxazolidine,benzoisooxazolidine, benzothiazolidine, 1,2,3- or 1,2,4-triazolidine,1,2,3- or 1,2,4-triazoline, 1,2,3- or 1,2,4-oxazolidine or -oxazoline,piperidine, di- and tetrahydropyridine, dihydro- and tetrahydropyran,di- and tetrahydrothiopyran, pipemine, dehydropiperazine, morpholine,thiomorpholine, 1,3- and 1,4-dioxan, 1,4-dithiane, azepane,1,3-Dioxolan, 1,3-dithiolane, pyrrole, indole, imidazole,benzoimidazole, furan, thiophene, benzofuran, benzothiophene, carbazole,dibenzofuran, dibenzothiophene, oxazole, isooxazole, thiazole,isothiazole, benzoxazole, benzothiazole, pyridine, pyrimidine, pyrazine,pyridazine, quinoline, isoquinoline, acridine, chromene, chroman, pyran,thiapyran, phenazine, phenoxazine, phenolthiazine, purine.

Representative examples of X in formula A are methylene, ethylene, 1,2-or 1,3-propylene, 1,2-, 1,3- or 1,4-butylene, ethylidene, 1,1- or2,2-propylidene, 1,1- or 2,2-butylidene, ethenylene, prop-1-en-1,3- or-1,2- or -2,3-ylene.

R_(b) and R_(c) as alkyl and hydroxyalkyl may be methyl, ethyl, n- orisopropyl, n-, iso- or tert-butyl, n-pentyl, n-hexyl, 2-hydroxyethyl, 2-or 3-hydroxypropyl, 2-, 3- or 4-hydroxybutyl. R_(d) as acyl is typicallyacetyl, propionyl and phenacyl.

In a preferred embodiment of the invention, the salts are Li.sup.⊕ orNH₄.sup.⊕ salts of carboxylic acids selected from the group consistingof furan-2-carboxylic acid, benzoic acid, methylbenzoic acid,phenylacetic acid, cinnamic acid, sorbic acid or C₂ -C₈ alkanecarboxylicacids.

The organic compound of non-salt character preferably contains 2 to 20,more particularly 2 to 16 and, most preferably, 2 to 12, carbon atoms.Most preferably the organic compound is an ester of an organicmonocarboxylic acid containing a total of 2 to 16 carbon atoms, an ethercontaining 2 to 12 carbon atoms, a ketone containing 3 to 16 carbonatoms, or an alcohol containing 5 to 16 carbon atoms.

In a preferred embodiment of the invention, the organic compound is a C₁-C₆ alkyl ester of furan-2-carboxylic acid, benzoic acid, methylbenzoicacid, phenylacetic acid, cinnamic acid, sorbic acid or a C₂ -C₈alkanecarboxylic acid; a C₅ -C₁₂ alkanol or benzyl alcohol; adialiphatic ketone of 3 to 10 carbon atoms, a C₁ -C₆ alkylphenyl ketoneor diphenyl ketone; or a dialiphatic ether of 2 to 8 carbon atoms, a C₁-C₆ alkylphenyl ether or diphenyl ether.

For carrying out the process of this invention the membrane can be ofdifferent shape and built into separating modules of conventionalconstruction. Thus, for example, flat membranes or asymmetricalmembranes can be combined to two- or multi-compartment systems. It isalso possible to use tubular membranes or hollow fibres which arenormally used in the form of bundles. To increase mechanical stability,the membranes can be mounted on a supporting frame. The membranes areprepared by known methods.

The process of the invention is normally carried out at roomtemperature. To attain a sufficient rate of flow it is advantageous toapply elevated pressure on the side of the solution. The pressure ispreferably 1 to 10 MPa, most preferably 1 to 6 MPa. In a specialembodiment of the invention, the process is carried out by thecountercurrent principle.

The process of the invention may be used as concentration orpurification process or for recovering or separating reaction componentsor by-products from reaction residues or reaction mixtures, or forisolating and purifying intermediates, especially when the substances inquestion are thermally labile.

The aromatic dicarboxylic acid radicals (a) can be radicals ofmononuclear or binuclear aryldicarboxylic acids which preferably containa total of 8 to 16 carbon atoms and which are unsubstituted orsubstituted by preferably F, Cl, Br or NO₂. The aromatic tricarboxylicacid radicals (b) can be radicals of mononuclear or binucleararyltricarboxylic acids which preferably contain 9 to 17 can atoms andwhich are unsubstituted or substituted by preferably F, Cl, Br or NO₂.

The diamine radicals (c) and (d) are preferably mononuclear or binucleararyl radicals which preferably contain 6 to 14 carbon atoms and which amunsubstituted or substituted by preferably F, Cl, Br methyl or ethyl.

The copolyamide or copolyimide-amide preferably contains 60 to 95 mol %,most preferably 75 to 95 mol %, of diamine radicals (c) and 5 to 40 mol%, most preferably 5 to 25 mol % of diamine radicals (d), based on saiddiamine radicals. The inherent viscosity of the copolyamides,copolyamide-imides or of the copolymers can be from 0.2 to 3.0 dl/g,preferably 0.3 to 2.0 dl/g and, most preferably, 0.3 to 1.2 dl/g.

In a preferred embodiment of the process of the invention, thecopolyamide and/or copolyimide-amide comprises

a) 60 to 95 mol % of at least one structural repeating unit of formulaeI and/or Ia, ##STR1## and b) 5 to 40 mol % of at least one structuralrepeating unit of formulae II and/or IIa, ##STR2## based on thecopolymers, wherein R₁ and R₅ are each independently of the other aradical of formula ##STR3## which radical is substituted or substitutedby Cl, Br, NO₂, C₁ -C₄ alkyl or C₁ -C₄ alkoxy, in which the formulae X₁is a direct bond, CH₂, ##STR4## --NR₉ --, --N═N--, --CO--, --O--, --S--,--SO-- or --SO₂ --, and R₉ is H or C₁ -C₆ alkyl,

R₃ and R₇ are each independently of the other a radical of formulae##STR5## wherein two bonds are linked to two adjacent carbon atoms, andX₂ independently has the same meaning as X₁,

R₂ and R₄ are each independently of the other an unsubstituted orchloro-, bromo- or C₁ -C₄ alkyl-substituted radical of formulae ##STR6##wherein X₃ independently has the same meaning as X₁, and R₆ und R₈ areeach independently of the other a radical of formulae ##STR7## whereinX₄ independently has the same meaning as X₁, R₁₀ is C₁ -C₄ alkyl, x is0, 1, 2 or 3 and M is H.sup.⊕, NH₄.sup.⊕, an alkali metal cation or aprimary, secondary, tertiary or quaternary ammonium cation of 1 to 24carbon atoms.

X₁, X₂, X₃ and X₄ are each independently of one another a direct bond--CH₂ --, --CO--, --S--or --O--.

Exemplary of aromatic dicarboxylic acids from which the radicals R₁ andR₅ are derived are terephthalic acid, isophthalic acid,4-nitroisophthalic acid, 4-chloroisophthalic acid,tetrabromoterephthalic acid, 4,4'-, 3,4'- or3,3'-diphenylmethanedicarboxylic acid, or 3,4'- or3,3'-diphenyldicarboxylic acid, or 3,4'- or 3,3'-diphenyletherdicarboxylic acid, or 3,4'- or 3,3'-diphenylsulfonedicarboxylic acid, or3,4'- or 3,3'-benzophenonedicarboxylic acid, 1,3-, 1,4-, 2,6- or2,7-naphthalenedicarboxylic acid. Further suitable aromatic dicarboxylicacids containing benzophenone units are disclosed, for example, inEP-A-0198798.

Preferred dicarboxylic acids are terephthalic and isophthalic acid whichmay be substituted by F, Cl, Br or NO₂, 4,4'-benzophenonedicarboxylicacid, 4,4'-diphenyldicarboxylic acid, 4,4'-diphenylmethanedicarboxylicacid, 4,4'-diphenyl ether dicarboxylic acid, and4,4'-diphenylsulfonedicarboxylic acid.

Exemplary of aromatic tricarboxylic acids from which R₃ and R₇ arederived are trimellitic acid, 1,6,7- or 2,6,7-naphthalenetricaxboxylicacid, 3,4,4'-diphenyltricarboxylic acid, or3,4,4'-diphenylmethanetricarboxylic acid, or 3,4,4'-diphenyl ethertricarboxylic acid, or 3,4,4'-diphenylthioether tricarboxylic acid, or3,4,4'-diphenylsulfonetricarboxylic acid, or3,4,4'-benzophenonetricarboxylic acid. The preferred tricarboxylic acidis trimellitic acid.

Examples of aromatic diamines from which R₂ and R₄ are derived aredescribed in EP-A-0 138 768. Representative examples are: m- orp-phenylenediamine, 4-chloro-m-phenylenediamine,3-chloro-p-phenylenediamine, mono- to tetramethylsubstituted m- orp-phenylenediamines; 1,3-, 2,6- or 2,7-naphthylenediamines which may besubstituted by Cl, methyl or ethyl; or diamines of formula B ##STR8##wherein the NH₂ groups are in m- or p-position to the X₃ group, X₃ is adirect bond, --CH₂ --, ##STR9## --O--, --S--, --SO₂ -- or --CO--, andthe benzene rings may preferably be substituted by methyl or ethyl,preferably in one or both o-positions to the NH₂ group. Preferreddiamines are m- and p-phenylenediamine, 4-chloro-m-phenylenediamine,4,4'-diamino-3,3'-dimethyldiphenylmethane,4,4'-diamino-3,3',5,5'-tetramethyldiphenylmethane,4,4'-diamino-2,2',6,6'-tetramethyldiphenylmethane

The diamines from which the radicals R₆ and R₈ are derived may be thesame diamines as indicated for R₂ and R₄, but they additionally containa SO₃ M group or one substitute is replaced by a SO₃ M group. The SO₃ Mgroup is preferably in the m-positions to the amino groups. Typicalexamples are (only given as sulfonic acids):3,5-diaminobenzene-1-sulfonic acid, 3,5-diamino-2-methyl- or-4-methylbenzene-1-sulfonic acid, 3,5-diamino-2,4-dimethyl- or-2,6-dimethylbenzenesulfonic acid,3,5-diamino-2,4,6-trimethylbenzene-1-sulfonic acid, 3,6- or3,7-diaminonaphthalene-1-sulfonic acid,3,3'-diaminodiphenyl-5,5'-disulfonic acid,3,3'-diamino-4,4'-dimethyldiphenyl-5,5'-disulfonic acid,3,3'-diamino-2,2',4,4'-tetramethyl-diphenyl-5,5'-disulfonic acid,4,4'-diaminodiphenyl-2,2'-disulfonic acid, 4,4'-diamino-3,3'- or-5,5'-dimethyldiphenyl-2,2'-disulfonic acid,4,4'-diamino-3,3',5,5'-tetramethyldiphenyl-2,2'-disulfonic acid, as wellas corresponding diphenylmethanedisulfonic acid, diphenyl etherdisulfonic acid, diphenyl thioether disulfonic acid,diphenylsulfonedisulfonic acid and benzophenonediaminodisulfonic acid.

In a preferred embodiment of the process of this invention, thecopolyamide is one comprising structural units of formulae I and II, andX_(l) and X₄ are each independently of the other a direct bond, --CH₂--, --CO--, --O-- or --S--.

In another preferred embodiment of the process, in the structural unitsof formula H of the copolyamide R₁ and R₅ are each independently of theother m- and/or p-phenylene which are unsubstituted or substituted by--NO₂ --, --Cl or --Br, R₂ is unsubstituted phenylene or phenylene whichis substituted by --Cl, --Br, methyl or ethyl, or is 3,3'- or4,4'-diphenylmethanediyl which is substituted in both o-positions to theamino groups by methyl and/or ethyl, and R₆ is a radical of formulae##STR10## wherein X₄ is a direct bond or --CH₂ --, R₁₀ is methyl orethyl, x is 1, 2 or 3, and M is H.sup.⊕, NH₄.sup.⊕, Li.sup.⊕, Na.sup.⊕,K.sup.⊕, Rb.sup.⊕, Cs.sup.⊕ or quaternary ammonium of 4 to 16 carbonatoms.

In a particularly preferred embodiment of the process of the invention,R₄ is a radical of formula ##STR11## wherein M is H.sup.⊕, NH₄.sup.⊕,Li.sup.⊕, Na.sup.⊕, K.sup.⊕, Rb.sup.⊕, Cs.sup.⊕ or quaternary ammoniumof 4 to 16 carbon atoms.

The preparation of the copolyamides and copolyimide-amides is carriedout in known manner for the membranes used in the process of theinvention. The monomers are either known or they can be prepared byknown processes. The membranes are prepared by known methods, forexample by the sheet casting method.

In EP-A-0 138 768 and EP-A-0 198 798 them are disclosedradiation-sensitive polyamides and polyimide-amides which containdiamine radicals carrying alkyl groups in the o-positions to the aminogroups and radicals of dicarboxylic acids containing benzophenonegroups. These polymers are only soluble in polar and aprotic organicsolvents and, after irradiation through a photomask, development canonly be effected with organic solvents--a disadvantageous procedure fromthe environmental aspect

Surprisingly, it has been found that copolyamides and copolyimide-amidesof aromatic dicarboxylic or tricarboxylic acids and aromatic diaminescarrying alkyl groups in the o-positions to the amino groups andaromatic diamines containing SO₃ M groups are radiation-sensitive, andare soluble and can be developed in polar and aprotic solvents and inaqueous basic media. The mechanical stability and solvent resistance ofmembranes for the separation process of this invention made from suchpolymers can be enhanced by irradiation.

The invention further relates to copolymers which are selected from thegroup of the copolyamides and copolyimide-amides having an inherentviscosity of 0.2 to 3.0 dl/g, measured at 25° C. in a solution of 0.5%by weight of copolymer in N-methylpyrrolidone, and which comprise, basedon the copolymer:

a) 10 to 95 mol % of at least one structural repeating unit of formulaeIII and/or IIIa ##STR12## and b) 5 to 90 mol % of at least onestructural repeating unit of formulae IV and/or IVa ##STR13## whereinR₁₁ and R₁₅ are each independently of the other divalent radicals of amononuclear or binuclear aromatic dicarboxylic acid of 8 to 20 carbonatoms, which radicals are each unsubstituted or substituted by halogen,nitro, C₁ -C₄ alkyl or C₁ -C₄ alkoxy,

R₁₃ and R₁₇ are each independently of the other trivalent radicals of amononuclear or binuclear aromatic tricarboxylic acid of 8 to 20 carbonatoms, which radicals are each substituted or substituted by halogen ornitro,

R₁₂ and R₁₄ are each independently of the other a radical of formula##STR14## wherein R₁₉ is C₁ -C₄ alkyl, X₅ is a direct bond, --CH₂ --,##STR15## --NR₉ --, --N═N--, --CO--, --O-- or --S-- and R₉ is H or C₁-C₆ alkyl, y is 0, 1, 2, 3 or 4 and

R₁₆ and R₁₈ are each independently of the other a radical of formula##STR16## wherein R₁₉ is C₁ -C₄ alkyl, x is 0, 1, 2 or 3, X₆ is a directbond, --CH₂ --, ##STR17## --NR₉ --, --N═N--, --CO--, --O--, --S--,--SO-- or --SO₂ -- and R₉ is H or C₁ -C₆ alkyl, and M is H.sup.⊕,NH₄.sup.⊕, a monovalent metal cation or an organic ammonium cation of 1to 30 carbon atoms,

with the proviso that, in at least one of the radicals R₁₂, R₁₄, R₁₆ andR₁₈, at least two radicals R₁₉ are in the ortho-positions of the freebonds.

Preferably y is 2, 3 or 4. In addition, x is preferably 2 or 3. R₁₉ ispreferably ethyl and, most preferably, methyl. In a preferred embodimentof the invention, y is 2, 3 or 4 and x is 2 or 3 and a pair of radicalsR₁₉ are preferably in both o-positions to the free bond.

The copolymers preferably comprise 60 to 95 mol % of structural units offormulae III and/or IIIa and 5 to 40 mol % of structural units offormulae IV and/or IVa.

Suitable aromatic dicarboxylic and tricarboxylic acids have beenpreviously mentioned. Preferred copolymers are those wherein R₁₁ and R₁₅are each independently of the other a radical of formula ##STR18## whichradical is unsubstituted or substituted by Cl, Br or NO₂, wherein X₁ isa direct bond, ##STR19## --NR₉ --, --N═N--, --CO--, --O--, --S--, --SO--or --SO₂ --, and R₉ is H or C₁ --C₆ alkyl, and R₁₃ and R₁₇ are eachindependently of the other a radical of formula ##STR20## wherein twobonds are attached to two adjacent carbon atoms and X₂ independently hasthe same meaning as X₁.

In a preferred embodiment of the invention R₁₁ and R₁₅ are eachindependently of the other unsubstituted o-, m- or p-phenylene or o-, m-or p-phenylene which is substituted by Cl, Br or NO₂, or a radical offormula ##STR21## wherein the free bonds are in m- or p-position to thegroup X₁, and X₁ is a direct bond, --CH₂ --, --O--, --S--, --SO₂ -- or--CO--.

M is preferably H.sup.⊕, NH₄.sup.⊕, an alkali metal cation or a primary,secondary, tertiary or quaternary ammonium cation of 1 to 24 carbonatoms.

R₁₉ is preferably methyl or ethyl.

R₁₂ and R₁₄ are preferably each independently of the other a radical offormula ##STR22## wherein in the first formula z is 0, 1 or 2 and thefree bonds are in m- or p-position to each other, and in the secondformula the free bonds are in m- or p-position to the CH₂ group, and thetwo CH₃ groups are each in the ortho-positions of the free bonds.

R₁₆ and R₁₈ are preferably each independently of the other a radical offormula ##STR23## wherein x is 0, 1, 2 or 3, X₆ is a direct bond, --CH₂--, --O--, --S--, --CO-- or --SO₂ --, and M is H.sup.⊕, NH₄.sup.⊕, analkali metal cation or primary, secondary, tertiary or quaternaryammonium of 1 to 24 carbon atoms.

In a particularly preferred embodiment of the invention the copolyamideis one containing structural repeating units of formula ##STR24##wherein R₁₁ and R₁₅ are each independently of the other substituted m-or p-phenylene or m- or p-phenylene which is substituted by Cl, Br ornitro, or ##STR25## R₁₂ is a radical of formula ##STR26## wherein z is0, 1 or 2, and R₁₆ is a radical of formula ##STR27## wherein M isH.sup.⊕, NH₄.sup.⊕, an alkali metal cation or primary, secondary,tertiary or quaternary ammonium of 1 to 24 carbon atoms.

The invention further relates to a process for the preparation of thenovel copolymers, which comprises reacting, based on the copolymer,

a) 50 mol % of at least one dicarboxylic acid of formulae V and/or Va##STR28## and/or at least one tricarboxylic acid of formulae VI and/orVIa

    R.sub.13 --(COOH).sub.3                                    (VI)

    R.sub.17 --(COOH).sub.3                                    (VIa)

or polyamide forming derivatives thereof, with

b) 5 to 47.5 mol % of at least one diamine of formulae VII and/or VIIa

    H.sub.2 N--R.sub.12 --NH.sub.2                             (VII)

    H.sub.2 N--R.sub.14 --NH.sub.2                             (VIIa)

and

c) 2.5 to 45 mol % of at last one dime of formulae VIII and/or VIIIa

    H.sub.2 N--R.sub.16 --NH.sub.2                             (VIII)

    H.sub.2 N--R.sub.18 --NH.sub.2                             (VIIIa)

The monomers used in the process of the invention are known and some arecommercially available.

Suitable polyamide forming derivatives are typically the acidanhydrides, acid amides, acid halides and acid esters. Suitableprocesses include solvent polymerisation, melt condensation andinterfacial polycondensation. Suitable solvents are cited below.

The reaction temperatures depend essentially on the starting materials,the preparatory processes and the reactivity thereof. They may be in therange from -50° to 350° C., preferably from 50° to 300° C. Thepolycondensation can also be carried out under normal pressure orpartial vacuum. Water, alcohol or amine formed in the come of thecondensation is conveniently removed from the reaction mixture, andhydrohalides such as HCl or HBr are neutralised by suitable agents, suchas tertiary amines or epoxides.

The novel copolymers arc polymers which can be crosslinked direct byirradiation. They are suitable for making sheets, fibres and for coatingsubstrates, for surface protection or for producing relief images, andthe properties of the polycondensates can be modified by irradiation.The high melting aromatic copolymers are preferably processed fromsolution.

A preferred field of use is that of coating surfaces and producingrelief images on such coated surfaces, to which utility the inventionalso relates. It is especially advantageous that, for attaining thedesired properties, the novel copolymers can be correspondingly adaptedfor specific requirements by the choice of different monomers and/or byblending different copolymers. A further particular advantage of thenovel polymers is their solubility in aqueous basic media, for examplein aqueous solutions of alkali metal hydroxides (NaOH, KOH), or inaqueous solutions of alkali metal carbonates (NaHCO₃, Na₂ CO, K₂ CO₃).

The invention further relates to a coated material containing on asupport a layer of a novel copolymer, wherein X₅ may additionally be--SO-- or --SO₂ --.

To prepare the coated material, a copolymer or a mixture thereof isdissolved preferably in a suitable organic solvent, with or withoutheating. Suitable solvents are polar aprotic solvents which may be usedby themselves or as mixtures of at least two solvents. Typical examplesof such solvents are: ethers such as dibutyl ether, tetrahydrofuran,dioxane, ethylene glycol, dimethyl ethylene glycol, dimethyl diethyleneglycol, diethyl diethylene glycol, dimethyl triethylene glycol,halogenated hydrocarbons such as methylene chloride, chloroform,1,2-dichlorethane, 1,1,1-trichloroethane, 1,1,2,2-tetrachloroethane,carboxylates and lactones such as ethyl acetate, methyl propionate,ethyl benzoate, 2-methoxyethylacetate, γ-butyrolactone, o-valerolactoneand pivalolactone, carboxamides and lactams such as formamide,acetamide, N-methylformamide, N,N-dimethylformamide,N,N-dimethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide,γ-butyrolactam, ε-caprolactam, N-methylpyrrolidone, N-acetylpyrrolidone,N-methylcaprolactam, tetramethylurea, hexamethylphosphoric triamide,sulfoxides such as dimethyl sulfoxide, sulfones such as dimethylsulfone, diethyl sulfone, trimethylene sulfone, tetramethylene sulfone,trimethylamine, triethylamine, N-methylpyrolidine, N-methylpiperidine,N-methylmorpholine, substituted benzenes such as chlorobenzene,nitrobenzene, phenols or cresol.

Undissolved constituents can be removed by filtration, preferablypressure filtration. The concentration of polymer in the coatingmaterial obtained is preferably not more than 50% by weight, moreparticularly not more than 30% by weight and, most preferably, not morethan 20% by weight, based on the solution.

During the preparation of the solutions it is possible to add furthercustomary modifiers which do not adversely affect the light sensitivity.Typical examples of such modifiers are: delustrants, levelling agents,finely particulate fillers, flame retardants, fluorescent whiteningagents, antioxidants, light stabilisers, dyes, pigments and adhesionpromoters. If desired, sensitisers may also be added, typicallythioxanthone derivatives or benzophenone derivatives, so as to enhancethe light sensitivity still further.

The coating composition can be applied to suitable substrates andcarrier materials by conventional methods such as dip coating, brushingand spraying, whirl coating, cascade coating and curtain coating.Suitable substrates include plastics, metals and metal alloys,semi-metals, semi-conductors, glass, ceramics and other inorganicmaterials such as SiO₂ and Si₃ N₄. The solvent may subsequently beremoved by heating and under vacuum. Tack-free, dry and uniform rams areobtained. Depending on the use, the films may have thicknesses up to c.500 μm and more, preferably from 0.5 to 500 μm and, most preferably,from 1 to 50 μm.

The radiation-sensitive layer in the material of this invention can becrosslinked by irradiation.

The photostructuring or photocrosslinking can be effected by high-energyradiation, typically by light, preferably in the UV range, by X-rays,laser light, electron beams and the like. The material of this inventionis admirably suitable for producing protective films, passivationcoatings, and as photographic recording material for heat-stable reliefimages.

The invention further relates to this utility. Fields of use includeprotective, insulating and passivation coatings in electrotechnology andelectronics, photomasks for electronics, textile printing and thegraphics industry, etch resists for making printed circuits and printingplates and integrated circuits, relays for making X-ray masks, as soldervarnish, as dielectric for multilayer circuits, as structural elementfor liquid crystal displays.

Protective films are produced by direct irradiation, the exposure timesdepending essentially on the layer thicknesses and thelight-sensitivity.

Photographic production of the relief structure is effected by imagewiseexposure through a photomask and subsequent development by removingunexposed areas with an aqueous alkaline medium, preferably an aqueoussolution of an alkali metal hydroxide (NaOH, KOH) or an aqueous solutionof an alkali metal carbonate (Na₂ CO₃, K₂ CO₃, KHCO₃, NaHCO₃), afterwhich the image produced may be stabilised by a thermal aftertreatment.

The invention further relates to a process for producing protectivecoatings or relief images, which comprises irradiating the layer of thematerial over the surface or through a photomask and thereafterdeveloping the image in an aqueous alkaline medium by dissolving out theunexposed areas.

The polymer layer of the material of this invention has alight-sensitivity sufficient for many end uses and in some cases ishigh, and it can be photocrosslinked direct. The protective films andrelief images are distinguished by good adhesion and by heat resistance,mechanical strength and resistance to chemicals. Only insignificantcontraction is observed in thermal aftertreatments. In addition, the useof modifiers for inducing or increasing light-sensitivity can beavoided. The material is storage stable, but must be protected from theaction of light.

The invention is illustrated in more detail by the following Examples.

A) Preparation of the copolymers

EXAMPLES A1-A15

The diamines, dissolved in N-methylpyrrolidone (NMP), are charged to a200 ml glass flask fitted with stirrer, reflux condenser, droppingfunnel, drying tube and cooling bath. The solution is cooled to 15° C.and propylene oxide is added. With efficient stirring, the dicarboxylicacid chlorides are added dropwise over 15 minutes. The solution isstirred for a further 3 hours at 15°-20° C. Then the copolymer isprecipitated by addition of methanol, the precipitate is isolated byfiltration and dried under a high vacuum at 40° C. Further particularswill be found in Table 1.

                                      TABLE 1                                     __________________________________________________________________________                             1. Dicarbonyl                                                                        2. Dicarbonyl                                                                        NMP.sup.1)                                                                         PPO.sup.2)                                                                         Inherent.sup.3)                  Diamine 1  Diamine 2 dichloride                                                                           dichloride                                                                           (amount                                                                            (amount                                                                            viscosity                    Ex. (mmol)     (mmol)    (mmol) (mmol) in g)                                                                              in g)                                                                              (dl/g)                       __________________________________________________________________________    A1  4,4'-diamino-3,5,3',5'-                                                                  3,5-diamino-2,4,6-                                                                      isophthaloyl                                                                         terephthaloyl                                                                        78   12   0.89                             tetramethyldiphenyl-                                                                     trimethylbenzene-1                                                                      dichloride                                                                           dichloride                                        methane    sulfonic acid tetra-                                                          butylammonium salt                                                 (22.5)     (2.5)     (7.5)  (17.5)                                        A2  4,4'-diamino-3,5,3',5'-                                                                  3,5-diamino-2,4,6-                                                                      4-nitro-iso-                                                                         terephthaloyl                                                                        62   8    0.69                             tetramethyldiphenyl-                                                                     trimethylbenzene-1-                                                                     phthaloyl                                                                            dichloride                                        methane    sulfonic acid tetra-                                                                    dichloride                                                          butylammonium salt                                                 (13.5)     (1.5)     (7.5)  (7.5)                                         A3  4,4'-diamino-2,6,2',6'-                                                                  3,5-diamino-2,4,6-                                                                      isophthaloyl                                                                         terephthaloyl                                                                        75   5    0.31                             tetramethyldiphenyl-                                                                     trimethylbenzene-1-                                                                     dichloride                                                                           dichloride                                        methane    sulfonic acid tetra-                                                          butylammonium salt                                                 (12.9)     (1.5)     (4.3)  (10.1)                                        A4  p-phenylenediamine                                                                       3,5-diamino-2,4,6-                                                                      isophthaloyl                                                                         terephthaloly                                                                        120  7    0.85                                        trimethylbenzene-1-                                                                     dichloride                                                                           dichloride                                                   sulfonic acid tetra-                                                          butylammonium salt                                                 (16.0)     (4.0)     (6.0)  (14.0)                                        A5  4-chloro-m-                                                                              3,5-diamino-2,4,6-                                                                      isophthaloyl                                                                         terephthaloyl                                                                        42   12   0.60                             phenylenediamine                                                                         trimethylbenzene-1-                                                                     dichloride                                                                           dichloride                                                   sulfonic acid tetra-                                                          butylammonium salt                                                 (18.0)     (2.0)     (6.0)  (14.0)                                        A6  4-chloro-m-                                                                              3,5-diamino-2,4,6-                                                                      4-nitro-iso-                                                                         terephthaloyl                                                                        72   8    0.39                             phenylenediamine                                                                         trimethylbenzene-1-                                                                     phthaloyl                                                                            dichloride                                                   sulfonic acid tetra-                                                                    dichloride                                                          butylammonium salt                                                 (13.5)     (1.5)     (7.5)  (7.5)                                         A7  4,4'-diamino-trans-                                                                      4,4'-diamino-3,3'-di-                                                                   isophthaloyl                                                                         terephthaloyl                                                                        80   3.5  0.690                            stilbene-2,2'-disul-                                                                     ethyl-5,5'-dimethyl-                                                                    dichloride                                                                           dichloride                                        fonic acid di-tetra-                                                                     diphenylmethane                                                    butylammonium                                                                 salt                                                                          (2.0)      (8.0)     (3.0)  (7.0)                                         A8  4,4'-diamino-diphenyl-                                                                   4,4'-diamino-3,3'-di-                                                                   isophthaloyl                                                                         terephthaloyl                                                                        80   3.5  0.482                            2,2'-disulfonic acid di-                                                                 ethyl-5,5'-dimethyl-                                                                    dichloride                                                                           dichloride                                        tetrabutylammonium                                                                       diphenylmethane                                                    salt                                                                          (0.5)      (9.5)     (3.0)  (7.0)                                         A9  4,4'-diamino-trans-                                                                      2,4,6-trimethyl-m-                                                                      isophthaloyl                                                                         diethylmalonyl                                                                       80   3.5  0.167                            stilbene-2,2'-disulfonic                                                                 phenylenediamine                                                                        dichloride                                                                           dichloride                                        acid di-tetra-butyl-                                                          ammonium salt                                                                 (0.5)      (9.5)     (9.0)  (1.0)                                         A10 4,4'-diamino-trans-                                                                      3,3'-5,5'-tetra-                                                                        isophthaloyl                                                                         terephthaloyl                                                                        80   3.5  1.257                            stilbene-2,2'-disul-                                                                     methylbenzidine                                                                         dichloride                                                                           dichloride                                        fonic acid di-tetra-                                                          butylammonium salt                                                            (0.5)      (9.5)     (3.0)  (7.0)                                         A11.sup.4)                                                                        3,5-diamino-2,4,6-                                                                       2,4,6-trimethyl-m-                                                                      isophthaloyl                                                                         terephthaloyl                                                                        80   3.5  0.460                            trimethylbenzene-1-                                                                      phenylenediamine                                                                        dichloride                                                                           dichloride                                        sulfonic acid tetra-                                                          butylammonium salt                                                            (8.0)      (1.0)     (3.0)  (7.0                                          A12 3,5-diamino-2,4,6-                                                                       2,4,6-trimethyl-m-                                                                      isophthaloyl                                                                         trans-3,6-endo-                                                                      80   3.5  0.249                            trimethylbenzene-                                                                        phenylenediamine                                                                        dichloride                                                                           methylene-                                        1-sulfonic acid tetra-      1,2,3,6-tetra-                                    butylammonium salt          hydrophthaloyl                                                                dichloride                                        (1.0)      (9.0)     (9.0)  (1.0)                                         A13 3,5-diamino-2,4,6-                                                                       2,4,6-trimethyl-m-                                                                      terephthaloyl                                                                        trans-3,6-endo-                                                                      80   3.5  0.246                            trimethylbenzene-                                                                        phenylenediamine                                                                        dichloride                                                                           methylene-                                        1-sulfonic acid tetra-      1,2,3,6-tetra-                                    butylammonium salt          hydrophthaloyl                                                                dichloride                                        (1.0)      (9.0)     (7.0)  (3.0)                                         A14.sup.5)                                                                        4,4'-diamino-trans-                                                                      4,4'-diamino-3,3'-                                                                      isophthaloyl                                                                         4,4'-stilbene-                                                                       80   3.5  0.249                            stilbene-2,2'-disul-                                                                     diethyl-5,5'-di-                                                                        dichloride                                                                           dicarbonyl                                        fonic acid di-tetra-                                                                     methyldiphenyl-  dichloride                                        butylammonium salt                                                                       methane                                                            (0.5)      (9.5)     (2.9)  (0.5)                                         A15 4,4'-diamino-                                                                            4,4'-diamino-3,3'-                                                                      tetrachloro-                                                                         terephthaloyl                                                                        80   3.5  0.192                            trans-stilbene-                                                                          diethyl-5,5'-di-                                                                        terephthaloyl                                                                        dichloride                                        2,2'-disulfonic                                                                          methyldiphenyl                                                                          dichloride                                               acid di-tetra-                                                                           methane                                                            butylammonium salt                                                            (0.5)      (9.5)     (3.0)  (7.0)                                         __________________________________________________________________________     .sup.1) NMP: Nmethylpyriolidone                                               .sup.2) PPO: propylene oxide                                                  .sup.3) inherent viscosity: 0.5% by weight in NMP, 25° C.              .sup.4) 3.diamine: 1.0 mmol % 2,4diaminobenzoic acid                          .sup.5) 3.dicarbonyl dichloride: 6.6 mmol % terephthaloyl dichloride     

B) Permeation experiments

EXAMPLES B1 to B8

The membrane (diameter 4.7 cm, thickness 25 μm) is secured in a supportin the centre of a pressure cell. Each compartment is connected to areservoir for the solution or pure solvent to which a pump is connected.Conductivity cells are positioned between reservoirs and pumps, and UVdetectors are positioned between outer and reservoirs. A pressure of 2.5MPa is applied on the side with the solution and a pressure of 0.3 MPaon the side with the solvent, and both the solution and the solutioncirculate in the same direction. The detectors treasure the conductivityand UV absorption continuously. The data are evaluated by means of acomputer program. The detectors are calibrated with the organic compound(methyl cinnamate) and with the salt of the carboxylic acid (lithiumsalt of cinnamic acid), and the calibration curves are converted intoalgorithms from which the desired data are computed. Methanol is used assolvent and the UV detection is carded out at 305 nm. The temperature is25° C.

The selctivity is defined as follows, G^(P) being the amount by weightin the permeate and G^(L) the amount by weight in the solution: ##EQU1##

Further particulars are given in Table 2.

                                      TABLE 2                                     __________________________________________________________________________                        Amounts at start  Permeated amounts at                                        of experiment.sup.1)                                                                            conclusion of experiment                                    methyl                                                                              Li    Duration of                                                                         methyl                                                                              Li                                   Copolyamide                                                                          Permeation rate                                                                         cinnamate                                                                           cinnamate                                                                           experiment                                                                          cinnamate                                                                           cinnamate                         Ex.                                                                              of Example                                                                           (mg · min.sup.-1 · cm.sup.-2)                                         (mg)  (mg)  (min) (mg)  (mg)  Selectivity                 __________________________________________________________________________    B1 A1     0.285     25    25    3060  1.00  0.25  3.95                        B2 A2     0.339     25    25    3060  0.94  0.11  8.52                        B3 A4     1.766     25    25    1680  3.25  1.17  2.78                        B4 A5     0.273     25    25    3780  0.96  0.50  1.11                        B5 A6     0.160     25    25    5040  0.23  0.10  2.28                        B6 A7     2.174     25    25    1020  2.05  0.24  8.54                        B7 A8     0.057     25    25    7050  0.48  0.27  1.77                                  0.057     .sup. .sup. 2520sup.3)                                                                          1.98.sup.2)                                                                         0.11.sup.3)                                                                         18.00                       B8 A10    0.446     .sup. .sup. 2040sup.3)                                                                          7.23.sup.2)                                                                         0.22.sup.3)                                                                         32.86                       __________________________________________________________________________     .sup.1) 0.005% by weight of                                                   .sup. 2) dimethyl phthalate                                                   .sup.3) 35% of the trilithium salt of trimellitic acid and 65% of the         dilithium salt of trimellitic acid                                       

C) Exposure Example

EXAMPLE C1

A copolyamide prepared from 13.5 parts by weight of4,4'-diamino-3,3',5,5'-tetramethyldiphenylmethane, 1.5 parts by weightof 3,5-diamino-2,4,6-trimethylbenzene-1-sulfonic acidtetra-n-butylammonium salt, 7.5 parts by weight of terephthaloyldichloride and 7.5 parts of 4-nitroisophthaloyl dichloride is dissolvedin N-methylpyrrolidone (10% by weight) and a copper laminate is coatedwith this solution with a 12μ, cable (spin-coating) and dried at 100° C.The coating is then exposed through a photomask (Stouffer wedge) for 180seconds at an intensity of 40 mW/cm² (lamp: Ultralux 5000 H, distance 70cm). Development is then carried out with 2N NaOH. The Stouffer step 6is still clearly imaged.

What is claimed is:
 1. A coated material comprising a substrate and acoating which coating contains a copolymer which is selected from thegroup consisting of copolyamides and copolyimide-amides having aninherent viscosity of 0.2 to 3.0 dl/g, measured at 25° C. in a solutionof 0.5% by weight of said copolymer in N-methylpyrrolidone, and whichcomprises, based on said copolymer:a) 10 to 95 mol % of a structuralrepeating unit of formulae III or IIIa or both ##STR29## and b) 5 to 90mol % of a structural repeating unit of formulae IV or IVa or both##STR30## wherein R₁₁ and R₁₅ are each independently of the otherdivalent radicals of a mononuclear or binuclear aromatic dicarboxylicacid of 8 to 20 carbon atoms, which radicals are each unsubstituted orsubstituted by halogen, nitro, C₁ -C₄ alkyl or C₁ -C₄ alkoxy,R₁₃ and R₁₇are each independently of the other trivalent radicals of a mononuclearor binuclear aromatic tricarboxylic acid of 8 to 20 carbon atoms, whichradicals are each unsubstituted or substituted by halogen or nitro, R₁₂and R₁₄ are each independently of the other a radical of formula##STR31## wherein R₁₉ is C₁ -C₄ alkyl, X₅ is a direct bond, or X₅ is--CH₂ --, --SO--, --SO₂ --, ##STR32## --HC═CH--, CH₃ CH<, (CH₃)₂ C<,--NR₉ --, --N═N--, --CO--, --O-- or --S-- and R₉ is H or C₁ -C₆ alkyl, yis 0, 1, 2, 3 or 4 and R₁₆ and R₁₈ are each independently of the other aradical of formula ##STR33## wherein R₁₉ is C₁ -C₄ alkyl, x is 0, 1, 2or 3, X₆ is a direct bond, or X₆ is --CH₂ --, R1 ? ##STR34## --HC═CH--,CH₃ CH<, (CH₃)₂ C<, --NR₉ --, --N═N--, --CO--, --O--, --S--, --SO-- or--SO₂ -- and R₉ is H or C₁ -C₆ alkyl, and M is H.sup.⊕, NH₄.sup.⊕, amonovalent metal cation or an organic ammonium cation of 1 to 30 carbonatoms, with the proviso that, in at least one of the radicals R₁₂, R₁₄,R₁₆ and R₁₈, x or y is at least two, and the R₁₉ radicals are in theortho-positions relative to the free bonds.
 2. A coated materialaccording to claim 1, wherein R₁₁ and R₁₅ are each independently of theother a radical of formula ##STR35## which radical is unsubstituted orsubstituted by Cl, Br or NO₂, wherein X₁ is a direct bond, CH₂,##STR36## --NR₉ --, --N═N--, --CO--, --O--, --S--, --SO-- or --SO₂ --,and R₉ is H or C₁ -C₆ alkyl, and R₁₃ and R₁₇ are each independently ofthe other a radical of formula ##STR37## wherein two bonds are attachedto two adjacent carbon atoms and X₂ independently has the same meaningas X₁.
 3. A coated material according to claim 1, wherein R₁₁ and R₁₅are each independently of the other unsubstituted o-, m- or p-phenyleneor o-, m- or p-phenylene which is substituted by Cl, Br or NO₂, or aradical of formula ##STR38## wherein the free bonds are in m- orp-position to the group X₁, and X₁ is a direct bond, --CH₂ --, --O--,--S--, --SO₂ -- or --CO--.
 4. A coated material according to claim 1,wherein X₁ is --CO--.
 5. A coated material according to claim 1, whereinM is H.sup.⊕, NH₄.sup.⊕, an alkali metal cation or a primary, secondary,tertiary or quaternary ammonium cation of 1 to 24 carbon atoms.
 6. Acoated material according to claim 1, wherein R₁₉ is methyl or ethyl. 7.A copolymer according to claim 1, wherein R₁₂ and R₁₄ are eachindependently of the other a radical of formula ##STR39## wherein in thefirst formula z is 0, 1 or 2 and the free bonds are in m- or p-positionto each other, and in the second formula the free bonds are in m- orp-position to the CH₂ group, and the two CH₃ groups are each in theortho-positions of the free bonds.
 8. A coated material according toclaim 1, wherein R₁₆ and R₁₈ are each independently of the other aradical of formula ##STR40## wherein x is 0, 1, 2 or 3, X₆ is a directbond, --CH₂ --, --O--, --S--, --CO-- or --SO₂ --, and M is H.sup.⊕,NH₄.sup.⊕, an alkali metal cation or primary, secondary, tertiary orquaternary ammonium of 1 to 24 carbon atoms.
 9. A coated materialaccording to claim 1, which contains structural repeating units offormula ##STR41## wherein R₁₁ and R₁₅ are each independently of theother unsubstituted m- or p-phenylene or m- or p-phenylene which issubstituted by Cl, Br or nitro, or ##STR42## R₁₂ is a radical of formula##STR43## wherein z is 0, 1 or 2, and R₁₆ is a radical of formula##STR44## wherein M is H.sup.⊕, NH₄.sup.⊕, an alkali metal cation orprimary, secondary, tertiary or quaternary ammonium of 1 to 24 carbonatoms.
 10. A coated material according to claim 1, which contains 60 to95 mol % of structural repeating units of formulae III and/or IIIa and 5to 40 mol % of structural repeating units of formula IV or IVa.
 11. Aprocess for the production of a relief image, which comprisesirradiating a coated material such that there are exposed and unexposedareas on the irradiated coated material and developing the relief imageby dissolving the unexposed areas of the coated material in an aqueousalkaline medium; wherein the coated material comprises a substrate and acoating, which coating contains a copolymer which is selected from thegroup consisting of copolyamides and copolyimide-amides having aninherent viscosity of 0.2 to 3.0 dl/g, measured at 25° C. in a solutionof 0.5% by weight of said copolymer in N-methylpyrrolidone, and whichcomprises, based on said copolymer:a) 10 to 95 mol % of a structuralrepeating unit of formulae III or IIIa or both ##STR45## and b) 5 to 90mol % of a structural repeating unit of formulae IV or IVa or both##STR46## wherein R₁₁ and R₁₅ are each independently of the otherdivalent radicals of a mononuclear or binuclear aromatic dicarboxylicacid of 8 to 20 carbon atoms, which radicals are each unsubstituted orsubstituted by halogen, nitro, C₁ -C₄ alkyl or C₁ -C₄ alkoxy,R₁₃ and R₁₇are each independently of the other trivalent radicals of a mononuclearor binuclear aromatic tricarboxylic acid of 8 to 20 carbon atoms, whichradicals are each unsubstituted or substituted by halogen or nitro, R₁₂and R₁₄ are each independently of the other a radical of formula##STR47## wherein R₁₉ is C₁ -C₄ alkyl, X₅ is a direct bond, or X₅ is--CH₂ --, --SO--, --SO₂, ##STR48## --HC═CH--, CH₃ CH<, (CH₃)₂ C<, --NR₉--, --N═N--, --CO--, --O-- or --S--, and R₉ is H or C₁ -C₆ alkyl, y is0, 1, 2, 3 or 4 and R₁₆ and R₁₈ are each independently of the other aradical of formula ##STR49## wherein R₁₉ is C₁ -C₄ alkyl, x is 0, 1, 2or 3, X₆ is a direct bond, or X₆ is --CH₂ --, ##STR50## --HC═CH--, CH₃CH<, (CH₃)₂ <, --NR₉ --, --N═N--, --CO--, --O--, --S--, --SO-- or --SO₂-- and R₉ is is H or C₁ -C₆ alkyl, and M is H.sup.⊕, NH₄.sup.⊕, amonovalent metal cation or an organic ammonium cation of 1 to 30 carbonatoms, with the proviso that, in at least one of the rascals R₁₂, R₁₄,R₁₆ and R₁₈, x or y is at least two, and the R₁₉ radicals are in theortho-positions relative to the free bonds.
 12. A process for theproduction of protective layers or relief images, which comprisesirradiating the layer of material according to claim 11 over the surfaceor through a photomask, and therafter developing the image so producedin an aqueous alkaline medium by dissolving out the unexposed areas. 13.A process according to claim 11, wherein R₁₁ and R₁₅ are eachindependently of the other a radical formula ##STR51## which radical isunsubstituted or substituted by Cl, Br or NO₂, wherein X₁ is a directbond, CH₂, ##STR52## --HC═CH--, CH₃ CH<, (CH₃)₂ C<, --NR₉ --, --N═N--,--CO--, --O--, --S--, --SO-- or --SO₂ --, and R₉ is H or C₁ -C₆ alkyl,and R₁₃ R₁₇ are each independently of the other a radical formula##STR53## wherein two bonds are attached to two adjacent carbon atomsand X₂ independently has the same meaning as X₁.
 14. A process accordingto claim 11, wherein R₁₁ and R₁₅ are each independently of the otherunsubstituted o-, m- or p-phenylene or o-, m- or p-phenylene which issubstituted by Cl, Br or NO₂, a radical of formula ##STR54## wherein thefree bonds are in m- or p-position to the group X₁, and X₁ is a directbond, --CH₂ --, --O--, --S--, --SO₂ -- or --CO--.
 15. A processaccording to claim 11, wherein X₁ is --CO--.
 16. A process according toclaim 11, wherein M is H.sup.⊕, NH₄.sup.⊕, an alkali metal cation or aprimary, secondary, tertiary or quaternary ammonium cation of 1 to 24carbon atoms.
 17. A process according to claim 11, wherein R₁₉ is methylor ethyl.
 18. A process according to claim 11, wherein R₁₂ and R₁₄ areeach independently of the other a radical of formula ##STR55## whereinin the first formula z is 0, 1 or 2 and the free bonds are in m- orp-position to each other, and in the second formula the free bonds arein m- or p-position to the CH₂ group, and the two CH₃ groups are each inthe ortho-positions of the free bonds.
 19. A process according to claim11, wherein R₁₆ and R₁₈ are each independently of the other a radical offormula ##STR56## wherein x is 0, 1, 2 or 3, X₆ is a direct bond, --CH₂--, --O--, --S--, --CO-- or --SO₂ --, and M is H.sup.⊕, NH₄.sup.⊕, analkali metal cation or primary, secondary, tertiary or quaternaryammonium of 1 to 24 carbon atoms.
 20. A process according to claim 11,which contains structural repeating units of formula ##STR57## whereinR₁₁ and R₁₅ are each independently of the other unsubstituted m- orp-phenylene or m- or p-phenylene which is substituted by Cl, Br ornitro, or ##STR58## R₁₂ is a radical of formula ##STR59## wherein z is0, 1 or 2, and R₁₆ is a radical of formula ##STR60## wherein M isH.sup.⊕, NH₄.sup.⊕, an alkali metal cation or primary, secondary,tertiary or quaternary ammonium of 1 to 24 carbon atoms.
 21. A processaccording to claim 11, which contains 60 to 95 mol % of structuralrepeating units of formulae III and/or IIIa and 5 to 40 mol % ofstructural repeating units of formula IV or IVa.